mireabulletinRussian Technological JournalRussian Technological Journal2782-32102500-316XRTU MIREA10.32362/2500-316X-2021-9-1-38-47mireabulletin-275Research ArticleМИКРО- И НАНОЭЛЕКТРОНИКА. ФИЗИКА КОНДЕНСИРОВАННОГО СОСТОЯНИЯMICRO- AND NANOELECTRONICS. CONDENSED MATTER PHYSICSМетрологические исследования характеристик многослойных поверхностных покрытий с использованием синхротронного излученияMetrological studies of the characteristics of multilayer surface coatings using synchrotron radiationСиговА. С.SigovA. S.

Сигов Александр Сергеевич, академик РАН, президент ФГБОУ ВО

119454,  Москва, пр-т Вернадского, д. 78.

ResearcherID L-4103-2017; Scopus Author ID: 35557510600

Alexander S. Sigov,Academician of RAS, President

78, Vernadskogo pr., Moscow 119454

ResearcherID L-4103-2017; Scopus Author ID: 35557510600

МинаеваО. А.MinaevaO. A.

Минаева Ольга Александровна,доктор технических наук, и.о. заведующего кафедрой Метрологии и стандартизации Физико-технологического института ФГБОУ ВО 

119454,  Москва, пр-т Вернадского, д. 78;

начальник лаборатории

119361,  Москва, ул. Озерная, д. 46

Scopus Author ID 6603019847

Olga A. Minaeva, Dr. Sci. (Engineering), Head of the Department of Metrology and Standardization, Institute of Physics and Technology

78, Vernadskogo pr., Moscow 119454

Head of Laboratory

46, Ozernaya ul., Moscow 119361

Scopus Author ID 6603019847

minaeva_o@mirea.ruАневскийС. И.AnevskyS. I.

Аневский Сергей Иосифович, доктор технических наук, начальник лаборатории

119361,  Москва, ул. Озерная, д. 46

Sergei I. Anevsky,Dr. Sci. (Engineering), Head of Laboratory

46, Ozernaya ul., Moscow 119361

ЛебедевА. М.LebedevA. M.

Лебедев Алексей Михайлович, кандидат физико-математических наук, старший научный сотрудник

123182, Москва, пл. Академика Курчатова, д. 1

Scopus Author ID55415462900.

Alexey M. Lebedev,Cand. Sci. (Phys.-Mat.), Senior Researcher

1, Akademika Kurchatova pl., Moscow 123182

Scopus Author ID 55415462900

МинаевР. В.MinaevR. V.

Минаев Роман Владимирович, кандидат технических наук, начальник научно-исследовательского отделения

119361, Москва, ул. Озерная, д. 46

Scopus Author ID 22235214600

Roman V. Minaev,Cand. Sci. (Engineering), Head of Research Department

46, Ozernaya ul., Moscow 119361

Scopus Author ID 22235214600

МИРЭА – Российский технологический университетРоссияMIREA – Russian Technological UniversityRussian FederationМИРЭА – Российский технологический университет; Всероссийский научно-исследовательский институт оптико-физических измерений ФГУП «ВНИИОФИ»РоссияMIREA – Russian Technological University; All-Russian Research Institute for Optical and Physical MeasurementsRussian FederationВсероссийский научно-исследовательский институт оптико-физических измерений ФГУП«ВНИИОФИ»РоссияAll-Russian Research Institute for Optical and Physical MeasurementsRussian FederationНИЦ «Курчатовский институт»РоссияKurchatov InstituteRussian Federation202102032021913847Copyright © Сигов А.С., Минаева О.А., Аневский С.И., Лебедев А.М., Минаев Р.В., 20212021Сигов А.С., Минаева О.А., Аневский С.И., Лебедев А.М., Минаев Р.В.Sigov A.S., Minaeva O.A., Anevsky S.I., Lebedev A.M., Minaev R.V.Данная работа распространяется под лицензией Creative Commons Attribution 4.0.This work is licensed under a Creative Commons Attribution 4.0 License.https://www.rtj-mirea.ru/jour/article/view/275

Исследования характеристик многослойных поверхностных наноструктур с использованием источников синхротронного излучения играют важную роль в развитии метрологического обеспечения наноэлектроники. Синхротронное  излучение характеризуется интенсивным, рассчитываемым континуумом в широком спектральном диапазоне. Исследования проводились на электронных накопительных кольцах «Сибирь-1» (НИЦ «Курчатовский ин-ститут», Москва) и MLS (РТВ, Берлин) с низкой энергией электронов в широком диапазоне длин волн, включающем видимое излучение, ближний, вакуумный и экстремальный ультрафиолет, мягкий рентген, для исключения влияния жесткого рентгеновского излучения. В основу методов определения характеристик радиометров, фотодиодов, фильтров и многослойных зеркал положено использование зависимости абсолютных значений спектральных энергетических характеристик синхротронного излучения от энергии и числа ускоренных электронов. Наибольшее внимание при проведении метрологических исследований с использованием синхротронного излучения уделялось определению абсолютной спектральной чувствительности кремниевых фотодиодов с многослойными фильтрами для интегральных радиометров, спектральных коэффициентов пропускания поверхностных слоев фотодиодов в области экстремального ультрафиолета и спектрального отражения суперрешеток.

The investigations of multilayer surface nanostructures characteristics was performed with synchrotron radiation sources, characterized by an intensive, calculated continuum. It plays an important role in nanoelectronics metrological base. The main research were carried out at electron storage rings «Siberia-1» (Kurchatov Institute) and MLS (PTB, Berlin) with low electron energy, in a wide wavelength range, including visible range, AUV, VU, EUV and to exclude the X-ray radiation influence. The methods of the radiometers, photodiodes, filters and multilayer mirrors characteristics measurements are based on the synchrotron  radiation  absolute spectral characteristics and accelerated electrons number variation. The metrological investigations with synchrotron radiation was concentrated on: – absolute spectral responsivety of silicon photodiodes with multilayer filters for integral radiometers applications; – spectral transmittances of surface layers of photodiodes in the extreme ultraviolet region; – spectral reflectance coefficient of superlattice. The characteristics of photodiodes and filters on a synchrotron radiation source are measured using a monochromator and a reference detector. The use of a synchrotron radiation channel makes it possible to study the spectral transmittance of thin films and multilayer structures formed in the in situ mode. To form multilayer nanostructures directly on the receiving surface of photodetectors, an ion-plasma sputtering module is used. The optical scheme of the channel provides for the possibility of using monochromators of grazing incidence for the range of photon energies from 25 to 100 ev and normal incidence for the range of photon energies from 4 to 25 ev. At a photon energy of 40 ev, the absolute spectral sensitivity was 70 ma / W for a photodiode with a surface multilayer filter applied. To develop an experimental technique for measuring the spectral reflection coefficient of multilayer mirrors, and to create standard samples, the Mo/Si  system was studied. Computer modeling of multi-layer coatings allows us to calculate the optical characteristics of superlattices in the extreme ultraviolet region. The obtained results of measurements of the spectral reflection coefficient of a multilayer coating in the photon energy range of 65–100 ev indicate a resonance reflection character with a max-imum at an energy of 83.5 ev and an energy width at a half-height of about 6.5 ev. The working wave-length of the reflecting mirror corresponds to the calculated one, which confirms the effectiveness of the adopted model.

многослойные поверхностные наноструктурысинхротронное излучениеэлектронные накопительные кольцаближнийвакуумный и экстремальный ультрафиолетрадиометрыфотодиодыфильтрымногослойные зеркаласпектральная плотность энергетической освещенностисуперрешетки: multilayer surface nanostructuressynchrotron radiationelectron storage ringsAUVvuV and euvradiometersphotodiodesfilters and multilayer mirrorsspectral irradiancesuperlatticeReferencesChkhalo N.I., Gusev S.A., Nechay A.N., Pariev D.E., Polkovnikov V.N., Salashchenko N.N., et al. High-reflection Mo/Be/Si multilayers for EUV lithography. Optic. Lett. 2017;42(240);5070–5073. https://doi.org/10.1364/OL.42.005070Chkhalo N.I., Gusev S.A., Nechay A.N., Pariev D.E., Polkovnikov V.N., Salashchenko N.N., et al. High-reflection Mo/Be/Si multilayers for EUV lithography. Optic. Lett. 2017;42(240);5070–5073. https://doi.org/10.1364/OL.42.005070Akhsakhalyan A.D., Kluenkov E.B., Lopatin A.Y., Luchin V.I., Nechay A.N., Pestov A.E. et al. Current status and development prospects for multilayer X-ray optics at the Institute for Physics of Microstructures Russian Academy of Sciences. Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques (J SURF INVEST-X-RAY+). 2017;11(1):1–19. https://doi.org/10.1134/S1027451017010049Akhsakhalyan A.D., Kluenkov E.B., Lopatin A.Y., Luchin V.I., Nechay A.N., Pestov A.E. et al. Current status and development prospects for multilayer X-ray optics at the Institute for Physics of Microstructures Russian Academy of Sciences. Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques (J SURF INVEST-X-RAY+). 2017;11(1):1–19. https://doi.org/10.1134/S1027451017010049Gottwald A., Scholze F. Advanced silicon radiation detectors in the vacuum ultraviolet and the extreme ultraviolet spectral range. In: Smart sensors and MEMs. Intelligent devices and microsystems for industrial applications, 2nd edition. (Eds.). S. Nihtianov, A. Luque. 2018. P. 151–170. https://doi.org/10.1016/B978-0-08-102055-5.00007-3Gottwald A., Scholze F. Advanced silicon radiation detectors in the vacuum ultraviolet and the extreme ultraviolet spectral range. In: Smart sensors and MEMs. Intelligent devices and microsystems for industrial applications, 2nd edition. (Eds.). S. Nihtianov, A. Luque. 2018. P. 151–170. https://doi.org/10.1016/B978-0-08-102055-5.00007-3Schwihys J. On the Classical Radiarion of Accelerated Electrons. Phys. Rev. 1949;75(12):1912–1925. https://doi.org/10.1103/PhysRev.75.1912Schwihys J. On the Classical Radiarion of Accelerated Electrons. Phys. Rev. 1949;75(12):1912–1925. https://doi.org/10.1103/PhysRev.75.1912Anevsky S., Ivanov V., Kuznetsov V., Minaeva O., et al. Primary UV-radiation detector standards. Metrologia. 2003;40(1):S25–S29. https://doi.org/10.1088/0026-1394/40/1/003Anevsky S., Ivanov V., Kuznetsov V., Minaeva O., et al. Primary UV-radiation detector standards. Metrologia. 2003;40(1):S25–S29. https://doi.org/10.1088/0026-1394/40/1/003Scholze F., Tummler J., Ulm G. High-accuracy radiometry in the EUV range at PTB soft x-ray beamline. Metrologia. 2003;40(1):S224–S228. https://doi.org/10.1088/0026-1394/40/1/352Scholze F., Tummler J., Ulm G. High-accuracy radiometry in the EUV range at PTB soft x-ray beamline. Metrologia. 2003;40(1):S224–S228. https://doi.org/10.1088/0026-1394/40/1/352Scholze F., Brandt G., Mueller P., Meyer B., Scholz F., Tummler J., Vogel K., Ulm G. High-accuracy detector calibration for EUV metrology at PTB. In: Emerging Lithographic Technologies VI. (Ed.) R.L. Engelstad. Proc. SPIE 4688. 2002. P. 680–689. https://doi.org/10.1117/12.472342Scholze F., Brandt G., Mueller P., Meyer B., Scholz F., Tummler J., Vogel K., Ulm G. High-accuracy detector calibration for EUV metrology at PTB. In: Emerging Lithographic Technologies VI. (Ed.) R.L. Engelstad. Proc. SPIE 4688. 2002. P. 680–689. https://doi.org/10.1117/12.472342Gottwald A., Kroth U., Kalinina E., Zabrodskii V. Optical properties of a Cr/4H-SiC photodetector in the spectral range from ultraviolet to extreme ultraviolet. Appl. Opt. 2018;57(28):8431–8436. https://doi.org/10.1364/AO.57.008431Gottwald A., Kroth U., Kalinina E., Zabrodskii V. Optical properties of a Cr/4H-SiC photodetector in the spectral range from ultraviolet to extreme ultraviolet. Appl. Opt. 2018;57(28):8431–8436. https://doi.org/10.1364/AO.57.008431Coric M., Saxena N., Pflüger M., Müller-Buschbaum P., Krumrey M., Herzig E.M. Resonant Grazing-Incidence SmallAngle X-ray Scattering at the Sulfur K-Edge for MaterialSpecific Investigation of Thin-Film Nanostructures. J. Phys. Chem. Lett. 2018;9(11):3081–3086. https://doi.org/10.1021/acs.jpclett.8b01111Coric M., Saxena N., Pflüger M., Müller-Buschbaum P., Krumrey M., Herzig E.M. Resonant Grazing-Incidence SmallAngle X-ray Scattering at the Sulfur K-Edge for MaterialSpecific Investigation of Thin-Film Nanostructures. J. Phys. Chem. Lett. 2018;9(11):3081–3086. https://doi.org/10.1021/acs.jpclett.8b01111Gottwald A., Wiese K., Siefke T., Richter M. Validation of thin film TiO2 optical constants by reflectometry and ellipsometry in the VUV spectral range. Meas. Sci. Technol. 2019;30(4):045201. https://doi.org/10.1088/1361-6501/ab0359Gottwald A., Wiese K., Siefke T., Richter M. Validation of thin film TiO2 optical constants by reflectometry and ellipsometry in the VUV spectral range. Meas. Sci. Technol. 2019;30(4):045201. https://doi.org/10.1088/1361-6501/ab0359Collon M.J., Vacanti G., Barrière N.M., Landgraf B., et al. Silicon pore optics mirror module production and testing. In: Proc. SPIE. 2019;11180:1118023. https://doi.org/10.1117/12.2535994Collon M.J., Vacanti G., Barrière N.M., Landgraf B., et al. Silicon pore optics mirror module production and testing. In: Proc. SPIE. 2019;11180:1118023. https://doi.org/10.1117/12.2535994Collon M.J., Vacanti G., Barrière N.M., Landgraf B., Günther R., Vervest M., Voruz L., et al. Status of the silicon pore optics technology. In: Proc. SPIE. 2019;11119:111190L. https://doi.org/10.1117/12.2530696Collon M.J., Vacanti G., Barrière N.M., Landgraf B., Günther R., Vervest M., Voruz L., et al. Status of the silicon pore optics technology. In: Proc. SPIE. 2019;11119:111190L. https://doi.org/10.1117/12.2530696Hönicke P., Detlefs B., Nolot E., Kayser Y., Mühle U., Pollakowski B., Beckhoff B. Reference-free grazing incidence X-ray fluorescence and reflectometry as a methodology for independent validation of X-ray reflectometry on ultrathin layer stacks and a depth-dependent characterization. J. Vac. Sci. Technol. 2019;37:041502. https://doi.org/10.1116/1.5094891Hönicke P., Detlefs B., Nolot E., Kayser Y., Mühle U., Pollakowski B., Beckhoff B. Reference-free grazing incidence X-ray fluorescence and reflectometry as a methodology for independent validation of X-ray reflectometry on ultrathin layer stacks and a depth-dependent characterization. J. Vac. Sci. Technol. 2019;37:041502. https://doi.org/10.1116/1.5094891Nechay A.N., Chkhalo N.I., Drozdov M.N., Garakhin S.A., Pariev D.E., Polkovni-kov V.N., Salashchenko N.N., Svechnikov M.V., Vainer Y.A., Meltchakov E., Delmotte F. Study of oxidation processes in Mo/Be multilayers. AIP Advances. 2018;8(7):075202. https://doi.org/10.1063/1.5007008Nechay A.N., Chkhalo N.I., Drozdov M.N., Garakhin S.A., Pariev D.E., Polkovni-kov V.N., Salashchenko N.N., Svechnikov M.V., Vainer Y.A., Meltchakov E., Delmotte F. Study of oxidation processes in Mo/Be multilayers. AIP Advances. 2018;8(7):075202. https://doi.org/10.1063/1.5007008Hönicke P., Holfelder I., Kolbe M., Lubeck J., Pollakowski B., Unterumsberger R., Weser J., Beckhoff B. Determination of SiO2 and C layers on a monocrystalline silicon sphere by reference-free x-ray fluorescence analysis. Metrologia. 2017;54(4):481–486. http://iopscience.iop.org/article/10.1088/1681-7575/aa765f/metaHönicke P., Holfelder I., Kolbe M., Lubeck J., Pollakowski B., Unterumsberger R., Weser J., Beckhoff B. Determination of SiO2 and C layers on a monocrystalline silicon sphere by reference-free x-ray fluorescence analysis. Metrologia. 2017;54(4):481–486. http://iopscience.iop.org/article/10.1088/1681-7575/aa765f/metaHaase A., V. Soltwisch V., Braun S., Laubis C., Scholze F. Interface morphology of Mo/Si multilayer systems with varying Mo layer thickness studied by EUV diffuse scattering. Opt. Express. 2017;25(13):15441–15445. https://doi.org/10.1364/OE.25.015441Haase A., V. Soltwisch V., Braun S., Laubis C., Scholze F. Interface morphology of Mo/Si multilayer systems with varying Mo layer thickness studied by EUV diffuse scattering. Opt. Express. 2017;25(13):15441–15445. https://doi.org/10.1364/OE.25.015441Svechnikov M., Pariev D., Nechay A., Salashchenko N., Chkhalo N., Vainer Y., Gaman D. Extended model for the reconstruction of periodic multilayers from extreme ultraviolet and X-ray reflectivity data. J. App. Crystallography. 2017;50(5):1428–1440. https://doi.org/10.1107/S1600576717012286Svechnikov M., Pariev D., Nechay A., Salashchenko N., Chkhalo N., Vainer Y., Gaman D. Extended model for the reconstruction of periodic multilayers from extreme ultraviolet and X-ray reflectivity data. J. App. Crystallography. 2017;50(5):1428–1440. https://doi.org/10.1107/S1600576717012286Garakhin S.A., Zabrodin I.G., Zuev S.Y., Kas’kov I.A., Lopatin A.Y., Nechay A.N., et al. Laboratory reflectometer for the investigation of optical elements in a wavelength range of 5–50 nm: description and testing results. Quantum Electron. 2017;47(4):385–392. https://doi.org/10.1070/QEL16300Garakhin S.A., Zabrodin I.G., Zuev S.Y., Kas’kov I.A., Lopatin A.Y., Nechay A.N., et al. Laboratory reflectometer for the investigation of optical elements in a wavelength range of 5–50 nm: description and testing results. Quantum Electron. 2017;47(4):385–392. https://doi.org/10.1070/QEL16300Collon M.J., Vacanti G., Barrière N.M., Landgraf B., et al. Silicon Pore Optics Mirror Module Production and Testing. In: Proc. SPIE. 2018;10699:106990Y. https://doi.org/10.1117/12.2314479Collon M.J., Vacanti G., Barrière N.M., Landgraf B., et al. Silicon Pore Optics Mirror Module Production and Testing. In: Proc. SPIE. 2018;10699:106990Y. https://doi.org/10.1117/12.2314479

The authors declare that there are no conflicts of interest present.