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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">mireabulletin</journal-id><journal-title-group><journal-title xml:lang="ru">Russian Technological Journal</journal-title><trans-title-group xml:lang="en"><trans-title>Russian Technological Journal</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2782-3210</issn><issn pub-type="epub">2500-316X</issn><publisher><publisher-name>RTU MIREA</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.32362/2500-316X-2016-4-3-18-26</article-id><article-id custom-type="elpub" pub-id-type="custom">mireabulletin-21</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Статьи</subject></subj-group></article-categories><title-group><article-title>ВЛИЯНИЕ НАРУШЕННЫХ СЛОЕВ НА ДИЭЛЕКТРИЧЕСКИЕ СВОЙСТВА КОНДЕНСАТОРНЫХ СТРУКТУР НА ОСНОВЕ СЕГНЕТОЭЛЕКТРИЧЕСКИХ ПЛЕНОК</article-title><trans-title-group xml:lang="en"><trans-title>INFLUENCE OF DISTURBED LAYERS ON THE DIELECTRIC PROPERTIES OF FERROELECTRIC THIN FILM CAPACITORS</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Лавров</surname><given-names>П. П.</given-names></name><name name-style="western" xml:lang="en"><surname>Lavrov</surname><given-names>P. P.</given-names></name></name-alternatives><email xlink:type="simple">lavrov@mirea.ru</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Московский технологический университет (МИРЭА)</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Moscow Technological University (MIREA)</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2016</year></pub-date><pub-date pub-type="epub"><day>28</day><month>06</month><year>2016</year></pub-date><volume>4</volume><issue>3</issue><fpage>18</fpage><lpage>26</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Лавров П.П., 2016</copyright-statement><copyright-year>2016</copyright-year><copyright-holder xml:lang="ru">Лавров П.П.</copyright-holder><copyright-holder xml:lang="en">Lavrov P.P.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://www.rtj-mirea.ru/jour/article/view/21">https://www.rtj-mirea.ru/jour/article/view/21</self-uri><abstract><p>Конденсаторные сегнетоэлектрические структуры являются основой многих современных устройств микроэлектроники, в том числе энергонезависимой памяти, пьезоэлектрических микроактюаторов, датчиков и пр. Тенденция миниатюризации подобных устройств, требует уменьшения толщины сегнетоэлектрического слоя, что приводит к снижению важнейших характеристик сегнетоэлектрических структур, таких как диэлектрическая проницаемость, остаточная поляризация, температура Кюри и др. Подобные толщинные зависимости, как правило, интерпретируют в рамках модели «нарушенного слоя», предполагающей существование несегнетоэлектрических нарушенных, «мертвых» слоев постоянной толщины на границе сегнетоэлектрик-металл. В данной работе исследованы диэлектрические характеристики конденсаторных структур на основе плотных и пористых пленок цирконата-титаната свинца (ЦТС) различной толщины. Проведено моделирование зависимостей диэлектрической проницаемости от толщины с учетом нарушенных слоев, определена оптимальная методика моделирования.</p></abstract><trans-abstract xml:lang="en"><p>Capacitor ferroelectric structures are the basis of many modern microelectronic devices, including non-volatile memory, piezoelectric micro-actuators, sensors etc. Miniaturization of such devices requires a reduction in the ferroelectric layer thickness, which reduces the major characteristics of ferroelectric structures, such as permittivity, remanent polarization, Curie temperature, and others. Such thickness dependences are usually explained by the "disturbed layer" model, which assumes the existence of a nonferroelectric (disturbed, dead) layer with uniform thickness on the ferroelectric-metal interface. In this paper, dielectric characteristics of the capacitor structures based on dense and porous lead zirconate titanate (PZT) films with different thicknesses are studied. Modeling of permittivity dependencies as a function of the ferroelectric film thickness considering the presence of disturbed layers is performed. The optimal modeling technique is proposed.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>сегнетоэлектрики</kwd><kwd>тонкие пленки</kwd><kwd>нарушенный слой</kwd><kwd>ЦТС</kwd><kwd>моделирование</kwd></kwd-group><kwd-group xml:lang="en"><kwd>ferroelectric</kwd><kwd>thin film</kwd><kwd>PZT</kwd><kwd>modeling</kwd><kwd>disturbed layer</kwd><kwd>dead layer</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Sakashita Y., Segawa H. Dependence of electrical properties on film thickness in Pb(ZrxTi1-x)O3 thin films produced by metalorganic chemical vapor deposition // J. Appl. Physics. 1993. V. 73. № 11. P. 7857-7863.</mixed-citation><mixed-citation xml:lang="en">Sakashita Y., Segawa H. 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