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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">mireabulletin</journal-id><journal-title-group><journal-title xml:lang="ru">Russian Technological Journal</journal-title><trans-title-group xml:lang="en"><trans-title>Russian Technological Journal</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2782-3210</issn><issn pub-type="epub">2500-316X</issn><publisher><publisher-name>RTU MIREA</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.32362/2500-316X-2020-8-1-67-79</article-id><article-id custom-type="elpub" pub-id-type="custom">mireabulletin-200</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>МИКРО- И НАНОЭЛЕКТРОНИКА. ФИЗИКА КОНДЕНСИРОВАННОГО СОСТОЯНИЯ</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>MICRO- AND NANOELECTRONICS. CONDENSED MATTER PHYSICS</subject></subj-group></article-categories><title-group><article-title>Особенности получения пьезоэлектрических тонких пленок методом плазменного напыления из порошкообразного AlN</article-title><trans-title-group xml:lang="en"><trans-title>Features of the receiving of piezoelectric thin films by plasma spraying of powdery AlN</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Фещенко</surname><given-names>В. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Feshchenko</surname><given-names>V. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Фещенко Валерий Сергеевич - доктор технических наук, доцент, начальник научно-производственной лаборатории № 1</p><p>121108, Москва, ул. Ивана Франко, д. 4</p></bio><bio xml:lang="en"><p>Valeriy S. Feshchenko - Dr.Sci. (Engineering), Associate Professor, Head of Research and Production Laboratory № 1</p><p>4, Ivan Franko St., Moscow 121108</p></bio><email xlink:type="simple">feshchenko@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Зяблюк</surname><given-names>К. Н.</given-names></name><name name-style="western" xml:lang="en"><surname>Zyablyuk</surname><given-names>K. N.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Зяблюк Константин Николаевич - кандидат физико-математических наук, начальник научно-производственной лаборатории № 4</p><p>121108, Москва, ул. Ивана Франко, д. 4</p></bio><bio xml:lang="en"><p>Konstantin N. Zyablyuk - Cand. Sci. (Physics and Mathematics), Head of Research and Production Laboratory № 4</p><p>4, Ivan Franko St., Moscow 121108</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Сенокосов</surname><given-names>Э. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Senokosov</surname><given-names>E. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Сенокосов Эдуард Александрович - доктор физико-математических наук, профессор заведующий кафедрой твердотельной электроники и микроэлектроники</p><p>MD - 3300, Приднестровская Молдавская республика, Тирасполь, ул. 25 Октября, д. 128</p></bio><bio xml:lang="en"><p>Eduard A. Senokosov - Dr.Sci. (Physics and Mathematics), professor, Head of the Department of Solid-State Electronics and Microelectronics</p><p>128, 25 of October St., Tiraspol MD 3300, Pridnestrovian Moldavian Republic</p></bio><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Чукита</surname><given-names>В. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Chukita</surname><given-names>V. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Чукита Виталий Исакович - старший преподаватель кафедры твердотельной электроники и микроэлектроники</p><p>MD - 3300, Приднестровская Молдавская республика, Тирасполь, ул. 25 Октября, д. 128</p></bio><bio xml:lang="en"><p>Vitaliy I. Chukita - Senior Lecturer at the Department of Solid-State Electronics and Microelectronics</p><p>128, 25 of October St., Tiraspol MD 3300, Pridnestrovian Moldavian Republic</p></bio><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Киселев</surname><given-names>Д. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Kiselev</surname><given-names>D. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Киселев Дмитрий Александрович - кандидат физико-математических наук, старший научный сотрудник кафедры материаловедения полупроводников и диэлектриков, ФГАОУ ВО «Национальный исследовательский технологический университет МИСиС»</p><p>119049, Москва, Ленинский пр-т, д. 4</p></bio><bio xml:lang="en"><p>Dmitriy A. Kiselev - Cand. Sci. (Physics and Mathematics), Senior Researcher of the Department of Materials sciences of Semiconductors and Dielectrics, The Federal State Educational Institution of the Higher Education National University of Science and Technology MISiS</p><p>4, Leninsky pr., Moscow 119049</p></bio><xref ref-type="aff" rid="aff-3"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>ООО «Производственно-технологический центр «УралАлмазИнвест»</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Proizvodstvenno-tekhnologicheskii tsentr “UralAlmazInvest”</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Приднестровский государственный университет им Т.Г. Шевченко</institution><country>Молдова</country></aff><aff xml:lang="en"><institution>Pridnestrovian State University</institution><country>Moldova, Republic of</country></aff></aff-alternatives><aff-alternatives id="aff-3"><aff xml:lang="ru"><institution>Фрязинский филиал Федерального государственного бюджетного учреждения науки Института радиотехники и электроники им. В.А. Котельникова Российской академии наук; Национальный исследовательский технологический университет «МИСиС»</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Fryazino Branch of the Kotelnikov Institute of Radio Engineering and Electronics of RAS; National University of Science and Technology “MISIS”</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2020</year></pub-date><pub-date pub-type="epub"><day>03</day><month>03</month><year>2020</year></pub-date><volume>8</volume><issue>1</issue><fpage>67</fpage><lpage>79</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Фещенко В.С., Зяблюк К.Н., Сенокосов Э.А., Чукита В.И., Киселев Д.А., 2020</copyright-statement><copyright-year>2020</copyright-year><copyright-holder xml:lang="ru">Фещенко В.С., Зяблюк К.Н., Сенокосов Э.А., Чукита В.И., Киселев Д.А.</copyright-holder><copyright-holder xml:lang="en">Feshchenko V.S., Zyablyuk K.N., Senokosov E.A., Chukita V.I., Kiselev D.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://www.rtj-mirea.ru/jour/article/view/200">https://www.rtj-mirea.ru/jour/article/view/200</self-uri><abstract><p>Одним из перспективных материалов в твердотельной электронике является соединение нитрид алюминия (AlN). Из него производят широкую номенклатуру полупроводниковых приборов: фотоприемники, светодиоды, пьезоэлектрические преобразователи и т. п. Широкому применению изделий на основе AlN препятствует невысокая технологичность изготовления структур на его основе. В связи с этим, разработка новых технологий для производства приборов на основе AlN является актуальной.Работа посвящена исследованию тонких пленок AlN, изготовленных с помощью плазменного напыления из порошка AlN. Проведен обзор существующих технологий получения тонких пленок AlN. Обсуждены их достоинства и недостатки. Приведены сведения о модернизации установки ВУП-5, позволившей произвести напыление пленки AlN из порошкообразного состояния.Одним из существенных преимуществ разработанного в этой работе процесса является то, что подложка нагревалась до температур не выше 300 oС, что позволяет, в свою очередь, совместить эту технологию с технологией кремниевых полупроводниковых приборов. В результате получены пленки толщиной 200 нм на различных подложках и исследована структура поверхности. Показано, что наименьшей шероховатостью обладают пленки AlN, напыленные на монокристаллические подложки – алмаз и кремний, а наихудшей шероховатостью обладают пленки, напыленные на ситалле.Методами ИК-спектроскопии были исследованы спектры пропускания полученных пленок AlN. С их помощью было показано, что на подложке образуется поликристаллический слой AlN, ориентированный в кристаллографическом направлении 002.С использованием методов сканирующей зондовой микроскопии были исследованы пьезоэлектрические свойства изготовленных пленок. Показано, что их пьезоэлектрический коэффициент d33 составляет для алмазной подложки 60% от значения для однодоменного монокристаллического образца, что говорит о достаточно высоком качестве полученной пленки.Сделан вывод, что, хотя качество слоев сильно зависит от подложки, но, тем не менее, они проявляют значительный пьезоэффект, что позволяет использовать этот метод для изготовления пьезодатчиков, излучателей ультразвука и т.п.</p></abstract><trans-abstract xml:lang="en"><p>Оne of the promising materials in solid state electronics is the AlN compound. A wide range of semiconductor devices are produced from it, such as photodetectors, LEDs, piezoelectric converters, etc. But the widespread use of products based on AlN prevents low manufacturability designs based on it. In this regard, the development of new technologies for the production of devices based on AlN is relevant.The work is devoted to the study of thin AlN films obtained by plasma spraying from AlN powder. The review of existing technologies of production of thin films AlN is carried out.Their advantages and disadvantages are discussed. Information on the modernization of the VUP-5 installation, which allowed to spray the AlN film from the powdered state, is given.One of the significant advantages of the process developed in this work is that the substrate is heated to temperatures no higher than 300 oC, which in turn allows to combine this technology with the technology of silicon semiconductor devices.As a result, films with a thickness of 200 nm on various substrates were obtained and their surface structure was studied. It is shown that AlN films deposited on single crystal substrates such as diamond and silicon have the least roughness, while films on sitall have the worst roughness.The transmission spectra of the obtained AlN films were investigated by IR spectroscopy. With their help, it was shown that a polycrystalline AlN layer oriented in the crystallographic direction 002 is formed on the substrate. The piezoelectric properties of the obtained films were investigated by scanning probe microscopy. It is shown that their piezoelectric coefficient d33 is 60% of the value for a single-domain single-crystal sample for a diamond substrate, which indicates a sufficiently high quality of the resulting film.It is concluded that, although the quality of the layers strongly depends on the substrate, nevertheless, they exhibit a significant piezoelectric effect, which allows the use of this method for the manufacture of piezoelectric sensors, ultrasonic emitters, etc.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>АlN</kwd><kwd>ИК-спектроскопия</kwd><kwd>плазменное напыление</kwd><kwd>пьезоэлектрики</kwd><kwd>тонкие слои</kwd></kwd-group><kwd-group xml:lang="en"><kwd>AlN</kwd><kwd>IR spectroscopy</kwd><kwd>plasma spraying</kwd><kwd>piezoelectric</kwd><kwd>thin layers</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Inoue Sh.-I., Tamari N., Taniguch M. 150 mW deep-ultraviolet light-emitting diodes with large-area AlN nanophotonic light-extraction structure emitting at 265 nm. 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