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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">mireabulletin</journal-id><journal-title-group><journal-title xml:lang="ru">Russian Technological Journal</journal-title><trans-title-group xml:lang="en"><trans-title>Russian Technological Journal</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2782-3210</issn><issn pub-type="epub">2500-316X</issn><publisher><publisher-name>RTU MIREA</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.32362/2500-316X-2018-6-2-46-55</article-id><article-id custom-type="elpub" pub-id-type="custom">mireabulletin-106</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>МИКРО- И НАНОЭЛЕКТРОНИКА. ФИЗИКА КОНДЕНСИРОВАННОГО СОСТОЯНИЯ</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>MICRO- AND NANOELECTRONICS. CONDENSED MATTER PHYSICS</subject></subj-group></article-categories><title-group><article-title>РАСЧЕТ УПРУГОНАПРЯЖЕННОЙ ГЕТЕРОСТРУКТУРЫ AlXGaYIn1-X-YAs/InP С КВАНТОВЫМИ ЯМАМИ ДЛЯ ЭФФЕКТИВНЫХ ЛАЗЕРНЫХ ИЗЛУЧАТЕЛЕЙ</article-title><trans-title-group xml:lang="en"><trans-title>CALCULATION OF ELASTICALLY STRESSED QUANTUM WELLS HETEROSTRUCTURE AlXGaYIn1-X-YAs/InP FOR EFFICIENT DIODE LASERS</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Светогоров</surname><given-names>В. Н.</given-names></name><name name-style="western" xml:lang="en"><surname>Svetogorov</surname><given-names>V. N.</given-names></name></name-alternatives><email xlink:type="simple">svetogorvlad@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Акчурин</surname><given-names>Р. Х.</given-names></name><name name-style="western" xml:lang="en"><surname>Akchurin</surname><given-names>R. Kh.</given-names></name></name-alternatives><email xlink:type="simple">noemail@neicon.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Мармалюк</surname><given-names>А. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Marmalyuk</surname><given-names>A. A.</given-names></name></name-alternatives><email xlink:type="simple">noemail@neicon.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ладугин</surname><given-names>М. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Ladugin</surname><given-names>M. A.</given-names></name></name-alternatives><email xlink:type="simple">noemail@neicon.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Яроцкая</surname><given-names>И. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Yarotskaya</surname><given-names>I. V.</given-names></name></name-alternatives><email xlink:type="simple">noemail@neicon.ru</email><xref ref-type="aff" rid="aff-2"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Московский технологический университет (Институт тонких химических технологий имени М.В Ломоносова)</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Moscow Technological University (M.V. Lomonosov Institute of Fine Chemical Technologies)</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>ООО «Сигм плюс»</institution><country>Россия</country></aff><aff xml:lang="en"><institution>JSC “Sigm Plyus”</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2018</year></pub-date><pub-date pub-type="epub"><day>28</day><month>04</month><year>2018</year></pub-date><volume>6</volume><issue>2</issue><fpage>46</fpage><lpage>55</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Светогоров В.Н., Акчурин Р.Х., Мармалюк А.А., Ладугин М.А., Яроцкая И.В., 2018</copyright-statement><copyright-year>2018</copyright-year><copyright-holder xml:lang="ru">Светогоров В.Н., Акчурин Р.Х., Мармалюк А.А., Ладугин М.А., Яроцкая И.В.</copyright-holder><copyright-holder xml:lang="en">Svetogorov V.N., Akchurin R.K., Marmalyuk A.A., Ladugin M.A., Yarotskaya I.V.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://www.rtj-mirea.ru/jour/article/view/106">https://www.rtj-mirea.ru/jour/article/view/106</self-uri><abstract><p>Выполнены расчеты составов эпитаксиальных слоев, формирующих низкоразмерные гетероструктуры AlxGayIn1-x-yAs/InP для лазерных диодов с длиной волны излучения 1.55 мкм. При проведении расчетов ставилась задача обеспечения максимальной высоты энергических барьеров для эффективного ограничения носителей заряда в квантовых ямах. Наряду с эффектом размерного квантования энергии свободных носителей заряда в разрешенных зонах, учитывалось влияние упругих напряжений в эпитаксиальных слоях на смещение краев энергетических зон. Показано, что для решения поставленных задач необходимо формирование гетероструктур с напряжениями упругого сжатия в квантовой яме и напряжениями упругого растяжения в барьерных слоях. Предложена структура, включающая барьерный слой Al0.28Ga0.30In0.42As толщиной 110 Å и квантовую яму Al0.03Ga0.23In0.74As в слое толщиной 55 Å со степенями рассогласования параметров кристаллической решетки с подложкой InP -0.8% и +1.4%, соответственно. По результатам расчетной оценки, указанные толщины эпитаксиальных слоев не превышают критических значений, способных привести к образованию дислокаций несоответствия на гетерограницах.</p></abstract><trans-abstract xml:lang="en"><p>The compositions of epitaxial layers forming quantum-well heterostructures AlxGayIn1-x-yAs / InP for laser diodes with the radiation wavelength of 1.55 μm are calculated. When carrying out the calculations, the problem was to provide the maximum height of the energy barriers for effective limitation of charge carriers in the quantum wells. Along with taking care of the effects of the dimensional quantization of the energy of free charge carriers in allowed zones, the effect of elastic stress in epitaxial layers on the displacement of the edges of the energy bands were taken into account in the calculation. It is shown that in order to solve the posed problems it is necessary to form heterostructures with elastic compression stress in a quantum well and elastic tensile stress in the barrier layers. As a result of the calculations the authors suggest a structure that includes a barrier layer of Al0.28Ga0.30In0.42As with a thickness of 110 Å and a quantum well Al0.03Ga0.23In0.74As in a layer with a thickness of 55Å (with the mismatch between the parameters of the crystal lattice and the InP substrate - 0.8% and + 1.4 %, respectively). According to the calculation results, the indicated thicknesses of epitaxial layers do not exceed the critical values that can lead to the formation of imperfect dislocations at heterointerfaces.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>лазерные диоды</kwd><kwd>квантовая яма</kwd><kwd>механические напряжения</kwd><kwd>уровни размерного квантования</kwd></kwd-group><kwd-group xml:lang="en"><kwd>AlxGayIn1-x-yAs/InP</kwd><kwd>laser diodes</kwd><kwd>quantum well</kwd><kwd>AlxGayIn1-x-yAs/InP</kwd><kwd>mechanical stress</kwd><kwd>dimensional quantization levels</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Qing K., Shaoyang T., Dan L., Ruikang Z., Wei W., Chen J. High power 1550 nm InGaAsP/ InP lasers with optimized carrier injection efficiency // Proceed. of the 14th Int. Conf. on Optical Communications and Networks (ICOCN). Nanjing, China. July 3, 2015. 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